PITC Metrology Program and Nobleo Technology B.V. have signed a Memorandum of Understanding to accelerate innovation in photonic wafer inspection and process monitoring.
Together we combine Nobleo’s expertise in image analysis and machine learning with PITC’s strong research and development ecosystem. The goal: next-generation metrology tools that boost process efficiency and yield in PIC manufacturing. Read more [Picture source: Nobleo Technology on linkedin.com]
