Microlithography lenses are used to project the image of an integrated circuit onto a silicon substrate. This tutorial demonstrates how to create a 21-element fused silica lens which has a NA of 0.56 which is designed to be used at a wavelength of 248nm. The lens, which has a total length of 1 meter, has a magnification of -0.25 with excellent image quality over a 23.4mm image circle. Download the application files
