Founded in 2011, Nobleo Technology has since grown to over 75 employees and offers expertise on the development of mechatronics design solutions, autonomous robotics and machine learning algorithms for high-tech applications. The latter brought them to the MEKOPP project, where they are responsible for the software that detects wafer defects on photonic wafers (PICs) with a step-and-scan microscope. The tool can process a 20-megapixel image in 100 milliseconds, targeting a throughput rate of 10 wafers per second (4 inch). The microscope generates PIC images with an image resolution of 0.3 mm and/or 0.1 mm. Read more [Source: hightechnl.nl]
